ACM Research Introduces “Ultra-C Tahoe” Wafer Cleaning Tool
August 23 2018 - 5:00PM
ACM Research, Inc. (NASDAQ: ACMR), a provider of wafer cleaning
equipment used by manufacturers of advanced semiconductors, today
announced the Ultra-C Tahoe, a new addition to its line of advanced
single-wafer cleaning tools.
Today’s conventional high-temperature single-wafer cleaners
provide good cleaning performance at advanced nodes, but consume
significant amounts of sulphuric acid and hydrogen peroxide.
During normal cleaning processes, only a fraction of the acid
reacts with the wafer surface, while the majority is wasted as acid
spins off the wafer and cannot be recycled. The excessive
acid usage causes unnecessary cost, greater safety requirements,
and more waste treatment for modern fab operations.
ACM’s Ultra-C Tahoe incorporates innovative and patented
technology to deliver high cleaning performance, but uses 20% or
less of the sulphuric acid typically consumed by conventional high
temperature single wafer cleaning tools. This offers
compelling environmental and economic benefits. ACM estimates
the Ultra-C Tahoe platform can save tens of millions of dollars a
year for a typical 100,000 wafer-per-month DRAM fab. This new
product is another example of ACM’s focus on differentiated and
patent-protected product offerings, intended to expand its market
opportunity and drive profitable longer-term revenue growth.
ACM’s President and Chief Executive Officer Dr. David
Wang commented, “The Ultra-C Tahoe is an exciting extension of
our industry-leading single-wafer wet cleaning product
family. Beyond the cost savings resulting from vastly reduced
acid consumption, Ultra-C Tahoe meets the needs of modern,
environmentally-aware manufacturing. In major semiconductor
manufacturing regions around the world, such as the Yangtze River
in China to the Ichon region in Korea, our customers face increased
regulations, and demand new environmentally-friendly tools such as
our Ultra-C Tahoe.”
Dr. Wang continued, “Our current megasonic cleaning platforms,
SAPS and TEBO, address an estimated 30 percent of the approximately
$2.7 billion total annual market for semiconductor cleaning
equipment. We believe the Ultra-C Tahoe product line expands
our addressable market by another 25 percent, bringing our total
addressable market opportunity to more than 55 percent of the $2.7
billion total. We are experiencing high interest for the
Ultra-C Tahoe from all of our existing, and several new potential
customers.”
ACM also announced today that it has received its first purchase
order from a major customer to deliver an Ultra-C Tahoe evaluation
tool during the fourth quarter of 2018. The Company expects
to recognize revenue for the product in 2019, upon customer
acceptance.
About ACM Research, Inc.
ACM Research develops, manufactures and sells single-wafer
wet cleaning equipment, which semiconductor manufacturers can use
in numerous manufacturing steps to remove particles, contaminants
and other random defects, and thereby improve product yield, in
fabricating advanced integrated circuits.
© ACM Research, Inc. SAPS and the ACM Research logo are
trademarks of ACM Research, Inc. All rights reserved. Any other
trademarks are the property of their respective owners.
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