GTC --
NVIDIA today
announced that TSMC and Synopsys are going into production with
NVIDIA’s computational lithography platform to accelerate
manufacturing and push the limits of physics for the next
generation of advanced semiconductor chips.
TSMC, the world’s leading foundry, and Synopsys, the leader in
silicon to systems design solutions, have integrated NVIDIA cuLitho
with their software, manufacturing processes and systems to speed
chip fabrication, and in the future support the latest-generation
NVIDIA Blackwell architecture GPUs.
“Computational lithography is a cornerstone of chip
manufacturing,” said Jensen Huang, founder and CEO of NVIDIA. “Our
work on cuLitho, in partnership with TSMC and Synopsys, applies
accelerated computing and generative AI to open new frontiers for
semiconductor scaling.”
NVIDIA also introduced new generative AI algorithms that enhance
cuLitho, a library for GPU-accelerated computational lithography,
dramatically improving the semiconductor manufacturing process over
current CPU-based methods.
Semiconductor Leaders Advance cuLitho
PlatformComputational lithography is the most
compute-intensive workload in the semiconductor manufacturing
process, consuming tens of billions of hours per year on CPUs. A
typical mask set for a chip — a key step in its production — could
take 30 million or more hours of CPU compute time, necessitating
large data centers within semiconductor foundries. With accelerated
computing, 350 NVIDIA H100 systems can now replace 40,000 CPU
systems, accelerating production time, while reducing costs, space
and power.
“Our work with NVIDIA to integrate GPU-accelerated computing in
the TSMC workflow has resulted in great leaps in performance,
dramatic throughput improvement, shortened cycle time and reduced
power requirements,” said Dr. C.C. Wei, CEO of TSMC. “We are moving
NVIDIA cuLitho into production at TSMC, leveraging this
computational lithography technology to drive a critical component
of semiconductor scaling.”
Since its introduction last year, cuLitho has enabled TSMC to
open new opportunities for innovative patterning technologies. In
testing cuLitho on shared workflows, the companies jointly realized
a 45x speedup of curvilinear flows and a nearly 60x improvement on
more traditional Manhattan-style flows. These two types of flows
differ — with curvilinear the mask shapes are represented by
curves, while Manhattan mask shapes are constrained to be either
horizontal or vertical.
“For more than two decades Synopsys Proteus mask synthesis
software products have been the production-proven choice for
accelerating computational lithography — the most demanding
workload in semiconductor manufacturing,” said Sassine Ghazi,
president and CEO of Synopsys. “With the move to advanced nodes,
computational lithography has dramatically increased in complexity
and compute cost. Our collaboration with TSMC and NVIDIA is
critical to enabling angstrom-level scaling as we pioneer advanced
technologies to reduce turnaround time by orders of magnitude
through the power of accelerated computing.”
Synopsys is the pioneer in delivering advanced techniques for
accelerating the performance of computational lithography.
Synopsys’ Proteus™ optical proximity correction software running on
the NVIDIA cuLitho software library significantly speeds
computational workloads compared to current CPU-based methods. With
Proteus mask synthesis products, manufacturers like TSMC can
achieve exceptional precision, efficiency and speed in proximity
correction, model building for correction, and analyzing proximity
effects on corrected and uncorrected IC layout patterns,
revolutionizing the chip fabrication process.
Breakthrough Generative AI Support for Computational
LithographyNVIDIA has developed algorithms to apply
generative AI to further enhance the value of the cuLitho platform.
The new generative AI workflow delivers an additional 2x speedup on
top of the accelerated processes enabled through cuLitho. The
application of generative AI enables creation of a near-perfect
inverse mask or inverse solution to account for diffraction of
light. The final mask is then derived by traditional and physically
rigorous methods, speeding up the overall optical proximity
correction (OPC) process by a factor of two.
Many changes in the fab process currently necessitate a revision
in OPC, driving up the amount of compute required and creating
bottlenecks in the fab development cycle. These costs and
bottlenecks are alleviated with the accelerated computing cuLitho
provides and generative AI, enabling fabs to allocate available
compute capacity and engineering bandwidth to design more novel
solutions in development of new technologies for 2nm and
beyond.
To learn more, watch Huang’s GTC keynote. Register for GTC to
attend 900+ sessions from NVIDIA and industry leaders through March
21.
About NVIDIASince its founding in 1993, NVIDIA
(NASDAQ: NVDA) has been a pioneer in accelerated computing. The
company’s invention of the GPU in 1999 sparked the growth of the PC
gaming market, redefined computer graphics, ignited the era of
modern AI and is fueling industrial digitalization across markets.
NVIDIA is now a full-stack computing infrastructure company with
data-center-scale offerings that are reshaping industry. More
information at https://nvidianews.nvidia.com/.
For further information, contact:Liz
ArchibaldNVIDIACorporate Communicationslarchibald@nvidia.com
Certain statements in this press release including, but not
limited to, statements as to: the benefits, impact, performance,
features, and availability of NVIDIA’s products and technologies,
including NVIDIA’s computational lithography platform, NVIDIA
Blackwell architecture GPUs, NVIDIA H100 systems, and the NVIDIA
cuLitho software library; third parties using our products,
services and platforms and our collaborations with them; our work
on cuLitho, in partnership with third parties, applying accelerated
computing and generative AI to open new frontiers for semiconductor
scaling; the new generative AI algorithms introduced by NVIDIA that
enhance cuLitho dramatically improving the semiconductor
manufacturing process over current CPU-based methods; a typical
mask set for a chip taking 30 million or more hours of CPU compute
time, necessitating large data centers within semiconductor
foundries; the ability of manufacturers like TSMC to achieve
exceptional precision, efficiency and speed in proximity
correction, model building for correction, and analyzing proximity
effects on corrected and uncorrected IC layout patterns,
revolutionizing the chip fabrication process with Synopsys’ Proteus
mask synthesis products; the application of generative AI enabling
creation of a near-perfect inverse mask or inverse solution to
account for diffraction of light; and the accelerated computing
cuLitho provides and generative AI enabling fabs to allocate
available compute capacity and engineering bandwidth to design more
novel solutions in development of new technologies for 2nm and
beyond are forward-looking statements that are subject to risks and
uncertainties that could cause results to be materially different
than expectations. Important factors that could cause actual
results to differ materially include: global economic conditions;
our reliance on third parties to manufacture, assemble, package and
test our products; the impact of technological development and
competition; development of new products and technologies or
enhancements to our existing product and technologies; market
acceptance of our products or our partners' products; design,
manufacturing or software defects; changes in consumer preferences
or demands; changes in industry standards and interfaces;
unexpected loss of performance of our products or technologies when
integrated into systems; as well as other factors detailed from
time to time in the most recent reports NVIDIA files with the
Securities and Exchange Commission, or SEC, including, but not
limited to, its annual report on Form 10-K and quarterly reports on
Form 10-Q. Copies of reports filed with the SEC are posted on the
company's website and are available from NVIDIA without charge.
These forward-looking statements are not guarantees of future
performance and speak only as of the date hereof, and, except as
required by law, NVIDIA disclaims any obligation to update these
forward-looking statements to reflect future events or
circumstances.
© 2024 NVIDIA Corporation. All rights reserved. NVIDIA and the
NVIDIA logo are trademarks and/or registered trademarks of NVIDIA
Corporation in the U.S. and/or other countries. Other company and
product names may be trademarks of the respective companies with
which they are associated. Features, pricing, availability, and
specifications are subject to change without notice.
A photo accompanying this announcement is available at
https://www.globenewswire.com/NewsRoom/AttachmentNg/0109143f-51c4-43da-83a2-ffde9a3b44d2
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