AEIS Advanced Energy Industries Inc

Advanced Energy's Xstream(TM) Remote Plasma Source With Active Matching Network(TM) Named One of Micro Magazine's 'Greatest Hits for 2003' Xstream Source Provides Unsurpassed Process Flexibility, System Throughput and Cost Efficiency FORT COLLINS, Colo., March 9 /PRNewswire-FirstCall/ -- Advanced Energy Industries today announced that its Xstream(TM) remote plasma source with Active Matching Network(TM) has been named one of MICRO Magazine's "Greatest Hits of 2003." This designation, from one ofthe industry's most respected publications, resulted from a critical evaluation by the magazine's editorial staff of all 2003 new product announcements in the semiconductor and advanced microelectronics supply chain. (Photo: NewsCom: http://www.newscom.com/cgi-bin/prnh/20030825/AEISLOGO ) Steve Rhoades, senior vice president and general manager of AE's Control Systems & Instrumentation group, stated, "We are honored to have our Xstream source chosen by the editors of MICRO as one the most outstanding products introduced in 2003. This designation further validates the technological innovation of our Xstream remote plasma source, which enables our customers to achieve a new level of process flexibility, system throughput and cost savings unmatched by other plasma sources in the industry today. The Xstream source provides original equipment manufacturers and chipmakers with the widest impedance operating range commercially available." Doug Schatz, chairman and chief executive officer of AE, noted, "We're very pleased that our patented, Xstream technology has been recognized for the significant process benefits it provides. This platform operates seamlessly with a broad range of chemistries, permitting our customers to optimize their processes -- as well as their expensive resources." The Xstream platform fully integrates a remote plasma source, a higher-power 8 kW or a standard-power 6 kW high-efficiency power supply and a solid-state Active Matching Network(TM). This platform deliversreactive gases in both upstream and downstream configurations for remote chemical vapor deposition (CVD) chamber clean, as well as other advanced semiconductor and flat-panel display applications. The Xstream remote plasma source provides customers with a highly cost-effective solution that extends the life of chamber consumables and fixtures, and reduces the particle generation inherent with in-situ plasma sources. About Advanced Energy Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass, and other advanced product applications. Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow and thermal management, plasma and ion beam sources, and integrated process monitoring and control for original equipment manufacturers (OEMs) and end-users around the world. AE operates in regional centers in North America, Asiaand Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. More information can be found at http://www.advanced-energy.com/. NOTE: Xstream and Active Matching Network are trademarks of Advanced Energy Industries, Inc. http://www.newscom.com/cgi-bin/prnh/20030825/AEISLOGO http://photoarchive.ap.org/ DATASOURCE: Advanced Energy Industries CONTACT: Marna Shillman of Corporate Communication Manager of Advanced Energy Industries, Inc., +1-970-407-6280, or ; or Dori Jones, Account Director of MCA, +1-650-968-8900, or , for Advanced Energy Industries, Inc. Web site: http://www.advanced-energy.com/

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