LEHIGH VALLEY, Pa.,
June 22 /PRNewswire-FirstCall/ -- The
rapid evolution from cell phones to smart phones and mobile
computing, use of netbooks, and more powerful personal computers is
continuing to drive demand for Dynamic Random Access Memory (DRAM).
As DRAM performance can no longer be advanced solely by reducing
feature size, integrated circuit manufacturers are now faced with
the challenge of integrating materials with extremely high
dielectric constants such as Strontium Titanium Oxide (STO). This
allows the memory element to be shrunk and enables increasing
amounts of data to be stored on each chip.
Earlier today, at the AVS 10th International Conference on
Atomic Layer Deposition in Seoul, South
Korea, Air Products (NYSE: APD) presented a paper entitled:
Control of Strontium Titanate Films for Next Generation
DRAM. The presentation was delivered by Dr. Laura Matz, technical manager for Advanced
Memory Materials at Air Products. During the conference, Air
Products also presented contributions describing the design of new
Strontium and Titanium precursors, and the development of
manufacturable delivery methods.
Air Products' EXTREMA® STO Precursors have been evaluated within
integrated capacitor structures and are able to achieve the target
dielectric constants needed for 2x nm and further technology nodes.
"By electrically testing the films deposited from Air Products Sr
and Ti precursors, we were able to prove that our precursors are
viable for the next generation of DRAM based on key electrical
metrics," said Dr. Matz. "When designing new precursors, it is
important to understand the interplay between the structure of a
precursor and its performance in depositing an acceptable thin
film. Our strong synthetic team is constantly working to optimize
precursor chemical structures to assure acceptable volatility and
deposition performance within the process reactor."
As part of the deposition process, Sr and Ti precursors are
evaporated from either the solid or liquid phase and delivered in
the gas phase to the deposition chamber. "Typically metalorganic
precursors can be very challenging to deliver reliably. As part of
our high-k precursor development program, we have established a
test platform that enables us to study all aspects of chemical
delivery in detail," said Matz. "We are committed to providing
products that address the challenges our customers face in
developing this next generation of DRAM capacitors."
To hear Dr. Matz's presentation, please go to:
www.airproducts.com/markets/Electronics/elearning_center/videos/100618_EXTREMA/msm.htm
For more information on the EXTREMA® STO and GST precursors,
please visit:
www.airproducts.com/Electronics/Technologies/High-K.htm
Air Products (NYSE: APD) serves customers in industrial, energy,
technology and healthcare markets worldwide with a unique portfolio
of atmospheric gases, process and specialty gases, performance
materials, and equipment and services. Founded in 1940,
Air Products has built leading positions in key growth markets
such as semiconductor materials, refinery hydrogen, home healthcare
services, natural gas liquefaction, and advanced coatings and
adhesives. The company is recognized for its innovative culture,
operational excellence and commitment to safety and the
environment. In fiscal 2009, Air Products had revenues of
$8.3 billion, operations in over 40
countries, and 18,900 employees around the globe. For more
information, visit www.airproducts.com.
***NOTE: This release may contain forward-looking statements.
Actual results could vary materially, due to changes in current
expectations.
SOURCE Air Products