MILPITAS, Calif., Sept. 11, 2017 /PRNewswire/ -- KLA-Tencor
Corporation (NASDAQ: KLAC) today introduced five patterning control
systems that help chipmakers achieve the strict process tolerances
required for multi-patterning technologies and EUV lithography at
the sub-7nm logic and leading-edge memory design nodes. Within the
IC fab, the ATL™ (Accurate Tunable Laser) overlay metrology system
and the SpectraFilm™ F1 film metrology system characterize
processes and monitor excursions during fabrication of finFET,
DRAM, 3D NAND and other complex devices. The Teron™ 640e reticle
inspection product line and the LMS IPRO7 reticle registration
metrology system facilitate development and qualification of EUV
and advanced optical reticles at mask shops. The 5D
Analyzer® X1 advanced data analysis system is the
foundation of an open architecture approach that supports
fab-customized analyses and real-time process control applications.
These five new systems extend KLA-Tencor's diverse portfolio of
metrology, inspection and data analysis systems that enable
identification and correction of process variations at the
source.
Logo
- http://photos.prnewswire.com/prnh/20140123/SF50413LOGO
"At the 7nm and 5nm design nodes, it is becoming increasingly
difficult for chipmakers to find specific sources of on-product
overlay error, critical dimension non-uniformity and hotspots,"
said Ahmad Khan executive vice
president of the Global Products Group at KLA-Tencor. "Our
customers are looking beyond scanner corrections to understand how
variations from all reticle and wafer process steps affect
patterning. Through open access to fab-wide metrology and
inspection data, IC engineers can quickly pinpoint and manage
process issues directly where they occur. Our systems, such as the
five introduced today, deliver our strongest technology to our
customers' experts, enabling them to drive down the patterning
error contributions of every wafer, reticle and process step."
The five new systems that support patterning control for sub-7nm
design node devices include:
- The ATL overlay metrology system utilizes unique tunable laser
technology with 1nm resolution to automatically maintain highly
accurate and robust overlay error measurements in the presence of
process variations, supporting fast technology ramps and accurate
wafer disposition during production.
- The SpectraFilm F1 film metrology system employs new optical
technologies that determine single- and multi-layer film
thicknesses and uniformity with high precision to monitor
deposition processes in production, and deliver bandgap data that
predict device electrical performance earlier than end-of-line
test.
- The Teron 640e reticle inspection product line incorporates
optical, detector and algorithm enhancements that detect critical
pattern and particle defects at high throughput, advancing the
development and qualification of EUV and optical patterned reticles
in leading-edge mask shops.
- The LMS IPRO7 reticle registration metrology system leverages a
new operating mode to accurately measure on-device reticle pattern
placement error with fast cycle time, enabling comprehensive
reticle qualification for e-beam mask writer corrections and
reduction of reticle-related contributions to device overlay errors
in the IC fab.
- The 5D Analyzer X1 data analysis system offers an extendible,
open architecture that accepts data from a wide range of metrology
and process tools to enable advanced analysis, characterization and
real-time control of fab-wide process variations.
ATL, SpectraFilm F1, Teron 640e, LMS IPRO7 and 5D Analyzer X1
are part of KLA-Tencor's unique 5D Patterning Control Solution™,
which also includes systems for patterned wafer geometry
measurements, in-situ process measurements, critical dimension and
device profile metrology, lithography and patterning simulation,
and discovery of critical hotspots. Several ATL, SpectraFilm F1 and
5D Analyzer X1 systems are in use at leading-edge IC manufacturers
worldwide, supporting a range of patterning control applications.
Through upgrades and new tool shipments, the Teron 640e and LMS
IPRO7 expand KLA-Tencor's strong installed base of reticle
inspection and metrology systems in advanced mask shops. To
maintain the high performance and productivity demanded by IC
manufacturing, ATL, SpectraFilm F1, Teron 640e, LMS IPRO7 and 5D
Analyzer X1 are backed by KLA-Tencor's global comprehensive service
network. More information on the five new systems can be found on
the advanced patterning control web page.
About KLA-Tencor:
KLA-Tencor Corporation, a leading
provider of process control and yield management solutions,
partners with customers around the world to develop
state-of-the-art inspection and metrology technologies. These
technologies serve the semiconductor and other related
nanoelectronics industries. With a portfolio of industry-standard
products and a team of world-class engineers and scientists, the
company has created superior solutions for its customers for more
than 40 years. Headquartered in Milpitas,
Calif., KLA-Tencor has dedicated customer operations and
service centers around the world. Additional information may be
found at www.kla-tencor.com (KLAC-P).
Forward Looking Statements:
Statements in this press
release other than historical facts, such as statements regarding
the expected performance of the ATL, SpectraFilm F1, Teron 640e,
LMS IPRO7 and 5D Analyzer X1 systems; the extendibility of the ATL,
SpectraFilm F1, Teron 640e, LMS IPRO7 and 5D Analyzer X1 systems to
future technology nodes; expected uses of the ATL, SpectraFilm F1,
Teron 640e, LMS IPRO7 and 5D Analyzer X1 systems by KLA-Tencor's
customers; and the anticipated cost, operational and other benefits
realizable by users of the ATL, SpectraFilm F1, Teron 640e, LMS
IPRO7 and 5D Analyzer X1 systems, are forward-looking statements,
and are subject to the Safe Harbor provisions created by the
Private Securities Litigation Reform Act of 1995. These
forward-looking statements are based on current information and
expectations, and involve a number of risks and uncertainties.
Actual results may differ materially from those projected in such
statements due to various factors, including delays in the adoption
of new technologies (whether due to cost or performance issues or
otherwise), the introduction of competing products by other
companies or unanticipated technological challenges or limitations
that affect the implementation, performance or use of KLA-Tencor's
products.
View original content with
multimedia:http://www.prnewswire.com/news-releases/kla-tencor-introduces-five-patterning-control-systems-for-sub-7nm-ic-manufacturing-300516145.html
SOURCE KLA-Tencor Corporation