SAN JOSE, Calif., June 29, 2016 /PRNewswire/ -- Ultratech,
Inc. (Nasdaq: UTEK), a leading supplier of lithography,
laser-processing and inspection systems used to manufacture
semiconductor devices and high-brightness LEDs (HB-LEDs), as well
as atomic layer deposition (ALD) systems, today announced that
National Taiwan University's (NTU) Nanoelectronic and Nanophotonic
Materials Laboratory (NNML) has selected the Fiji G2 ALD system for their research
activities. The NNML will serve as a focal point of collaborative
research with Ultratech-CNT, as well as a demonstration site for
customers interested in Ultratech-CNT's ALD systems.
While NTU is currently working with several Ultratech ALD
systems, Professor Miin-Jang Chen,
Taiwan's leading ALD researcher
and head of the NNML, said, "We are planning to use the new
Fiji G2 system to deposit a range
of materials that are not easily accessible using a standard ALD
system. We plan to take advantage of the Low Vapor Pressure
Delivery (LVPD) option in developing advanced ternary and
quaternary materials as part of our research into high-quality
III-nitride atomic layer epitaxy, metallic nanostructures for
plasmonics and surface-enhanced Raman scattering, advanced
high-K/metal gate stacks, and ferroelectric negative capacitance
for nanoelectronics. We have been working with the Savannah and
Fiji ALD systems for over eight years and have found them to be
excellent research tools. Our decision to move forward with our
most recent purchase and to establish a collaborative relationship
with Ultratech-CNT was based on our confidence in the performance
of these products and in the consistency of support we have always
received from the Ultratech-CNT staff over the years."
Ultratech-CNT Vice President of Research and Engineering, Ganesh
Sundaram, Ph.D., said, "Our long-term relationship with Professor
Chen is a testament to the durability and productivity of our
systems. Professor Chen's ALD research is highly regarded, and we
are extremely pleased that he has chosen to work in partnership
with us. We believe this collaboration will provide us with key
opportunities to interact with his group on a scientific basis and
allow researchers interested in ALD access to learn more about our
instruments and their use by visiting the NTU facility."
Ultratech Fiji G2 ALD System
For advanced thin films,
the Fiji series is a modular,
high-vacuum ALD system that accommodates a wide range of deposition
modes using a flexible architecture and multiple configurations of
precursors and plasma gases. The result is a next-generation ALD
system capable of performing thermal and plasma-enhanced
deposition. Ultratech CNT has applied advanced computational fluid
dynamics analyses to optimize the Fiji reactor, heaters, and vapor trap
geometries. The system's intuitive interface makes it easy to
monitor and change recipes and processes as required. The
Fiji is available in several
different configurations, with up to six heated precursor ports
that can accommodate solid, liquid or gas precursors, and up to six
plasma gas lines. Options include a built-in ozone generator, Load
Lock as well as several in-situ analysis tools, which offer
significant experimental flexibility in a compact and affordable
footprint.
Safe Harbor
This release includes forwardlooking
statements within the meaning of the Private Securities Litigation
Reform Act of 1995. Forwardlooking statements can generally be
identified by words such as "anticipates," "expects," "remains,"
"thinks," "intends," "believes," "estimates," and similar
expressions and include management's current expectation of its
longer term prospects for success. These forwardlooking statements
are based on our current expectations, estimates, assumptions and
projections about our business and industry, and the markets and
customers we serve, and they are subject to numerous risks and
uncertainties that may cause these forwardlooking statements to be
inaccurate. Such risks and uncertainties include the timing and
possible delays, deferrals and cancellations of orders by
customers; quarterly revenue fluctuations; industry and sector
cyclicality, instability and unpredictability; market demand for
consumer devices utilizing semiconductors produced by our clients;
our ability to manage costs; new product introductions, market
acceptance of new products and enhanced versions of our existing
products; reliability and technical acceptance of our products; our
lengthy sales cycles, and the timing of system installations and
acceptances; lengthy and costly development cycles for
laserprocessing and lithography technologies and applications;
competition and consolidation in the markets we serve;
improvements, including in cost and technical features, of
competitors' products; rapid technological change; pricing
pressures and product discounts; our ability to collect
receivables; customer and product concentration and lack of product
revenue diversification; inventory obsolescence; general economic,
financial market and political conditions and other factors outside
of our control; domestic and international tax policies;
cybersecurity threats in the United
States and globally that could impact our industry,
customers, and technologies; and other factors described in our SEC
reports including our Annual Report on Form 10K filed for the year
ended December 31, 2015 and our
Quarterly Report on Form 10-Q filed for the quarterly period ended
April 2, 2016. Due to these and other
factors, the statements, historical results and percentage
relationships set forth herein are not necessarily indicative of
the results of operations for any future period. We undertake no
obligation to revise or update any forwardlooking statements to
reflect any event or circumstance that may arise after the date of
this release.
Additional Information: In connection with the
solicitation of proxies, Ultratech, Inc. ("Ultratech") has filed
with the Securities and Exchange Commission (the "SEC"), a
definitive proxy statement and other relevant documents concerning
the proposals to be presented at Ultratech's 2016 Annual Meeting of
Stockholders (the "2016 Annual Meeting"). The proxy statement
contains important information about Ultratech and the 2016 Annual
Meeting. In connection with the 2016 Annual Meeting,
Ultratech has mailed the definitive proxy statement to
stockholders. In addition, Ultratech files annual, quarterly
and special reports, proxy statements and other information with
the SEC. You are urged to read the proxy statement and other
information because they contain important information about
Ultratech and the proposals to be presented at the 2016 Annual
Meeting. These documents are available free of charge at the
SEC's website (www.sec.gov) or from Ultratech at our investor
relations website (http://ir.ultratech.com). The contents of
any websites referenced herein are not deemed to be incorporated by
reference into the proxy statement.
Ultratech and its directors, executive officers and certain
employees may be deemed to be participants in the solicitation of
proxies from Ultratech's stockholders in connection with the
election of directors and other matters to be proposed at the
2016 Annual Meeting. Information regarding the interests,
if any, of these directors, executive officers and specified
employees is included in the definitive proxy statement and other
materials filed by Ultratech with the SEC.
About National Taiwan University: National Taiwan University offers a rich history of
scientific discovery as one of the most influential universities in
research. Founded in 1928, the university has 11 colleges, with 54
departments and 105 graduate institutes. The university boasts 5
international research centers, 6 national research centers and 38
university research centers. The total number of students,
including those enrolled at the School of Professional and
Continuing Studies, has grown to over 33,000, including over 17,000
university students and 15,000 graduate students. Visit NTU online
at: www.ntu.edu.tw.
About Ultratech: Ultratech, Inc. (Nasdaq: UTEK) designs,
builds and markets manufacturing systems for the global technology
industry. Founded in 1979, Ultratech serves three core markets:
frontend semiconductor, backend semiconductor, and
nanotechnology. The company is the leading supplier of lithography
products for bump packaging of integrated circuits and high
brightness LEDs. Ultratech is also the market leader and pioneer of
laser spike anneal technology for the production of advanced
semiconductor devices. In addition, the company offers solutions
leveraging its proprietary coherent gradient sensing (CGS)
technology to the semiconductor wafer inspection market and
provides atomic layer deposition (ALD) tools to leading research
organizations, including academic and industrial institutions.
Visit Ultratech online at: www.ultratech.com.
(UTEKG)
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SOURCE Ultratech, Inc.