Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, announced today that it will host its Analyst Day at 10:00 a.m. Central Time on Thursday, November 2, 2006, at the company's headquarters in Aurora, Illinois. During the event, Cabot Microelectronics' Chairman and CEO, William Noglows, and members of his leadership team will deliver presentations regarding the company�s business and strategy. Forward looking and other material information may be discussed during the event. Formal presentations will be webcast live from 10:00 a.m. to noon and from 1:30 pm to 3:00 p.m., Central Time. Interested parties may listen to the webcast and view the accompanying slide presentations by visiting the Investor Relations� page of the company�s website, www.cabotcmp.com. The webcast will be archived on the company�s website for 30 days. ABOUT CABOT MICROELECTRONICS CORPORATION Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP slurries used in semiconductor and data storage manufacturing. The company's products play a critical role in the production of the most advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. Since becoming an independent public company in 2000, the company has grown to nearly 750 employees who work at research and development labs, sales and business offices, manufacturing facilities and customer service centers in China, France, Germany, Japan, Singapore, South Korea, Taiwan, the United Kingdom and the United States. The company's vision is to become the world leader in shaping, enabling and enhancing the performance of surfaces, and thus looks beyond its core CMP business in the semiconductor industry. For more information about Cabot Microelectronics Corporation, visit www.cabotcmp.com or contact Barbara Ven Horst, Director of Investor Relations at (630) 375-5412. Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries to the semiconductor industry, announced today that it will host its Analyst Day at 10:00 a.m. Central Time on Thursday, November 2, 2006, at the company's headquarters in Aurora, Illinois. During the event, Cabot Microelectronics' Chairman and CEO, William Noglows, and members of his leadership team will deliver presentations regarding the company's business and strategy. Forward looking and other material information may be discussed during the event. Formal presentations will be webcast live from 10:00 a.m. to noon and from 1:30 pm to 3:00 p.m., Central Time. Interested parties may listen to the webcast and view the accompanying slide presentations by visiting the Investor Relations' page of the company's website, www.cabotcmp.com. The webcast will be archived on the company's website for 30 days. ABOUT CABOT MICROELECTRONICS CORPORATION Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP slurries used in semiconductor and data storage manufacturing. The company's products play a critical role in the production of the most advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. Since becoming an independent public company in 2000, the company has grown to nearly 750 employees who work at research and development labs, sales and business offices, manufacturing facilities and customer service centers in China, France, Germany, Japan, Singapore, South Korea, Taiwan, the United Kingdom and the United States. The company's vision is to become the world leader in shaping, enabling and enhancing the performance of surfaces, and thus looks beyond its core CMP business in the semiconductor industry. For more information about Cabot Microelectronics Corporation, visit www.cabotcmp.com or contact Barbara Ven Horst, Director of Investor Relations at (630) 375-5412.
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