II-VI Incorporated Introduces Heated Ion Implantation Foundry Services for 150 mm Silicon Carbide Wafers
June 21 2021 - 9:00AM
II‐VI Incorporated (Nasdaq: IIVI), a leading global provider of
foundry ion implantation services and support to the
microelectronics industry, today announced the introduction of
heated ion implantation foundry services for 150 mm silicon
carbide (SiC) wafers.
The growing interest in clean energy is accelerating the
electrification of the global energy and transport infrastructure
and driving the demand for power electronics with high reliability
that can be produced at scale. II-VI now offers the world’s most
advanced ion implantation foundry services and support for
state-of-the-art 150 mm diameter SiC wafers. II-VI’s ion
implantation process enables highly reliable power electronics by
running at temperatures of up to 650 ⁰C to anneal the crystal
structure dynamically and eliminate defects. The process provides a
very high level of doping precision, both in terms of depth and
concentration.
“To our knowledge, II-VI is the first foundry in the world to
provide such advanced ion implantation services commercially for
150 mm SiC wafers and we plan to scale to 200 mm in the future,”
said Sohail Khan, Executive Vice President, New Ventures &
Wide-Bandgap Electronics Technologies Business Unit. “II-VI’s new
ion implantation process is extremely versatile: It delivers a
broad energy range from 10 keV to 1 MeV and can be heated or
unheated for a wide range of compound semiconductor wafer materials
and devices. This process is compatible with a vast array of
materials, including silicon and diamond for special-purpose
applications, as well as those that can be integrated into
wafer-scale optics platforms.”
II-VI implants tens of thousands of wafers per week and adds
tools and capacity as required to support customers’ changing
needs, provides capacity for urgent spikes in demand, and offers
same-day turnaround. II-VI’s world-class technical expertise,
rigorous quality program, and broad range of tooling offer a
powerful and flexible outsourcing option for ion implantation,
serving production manufacturing and R&D environments.
II-VI maintains a large complement of high- and medium-current
and high-energy production implanters handling 2-inch to 12-inch
substrates. II-VI’s broad range of wafer foundry services includes
silicon carbide, gallium arsenide, and indium phosphide epitaxial
growth. II-VI also provides ion implantation disk refurbishing and
reconditioning services to maximize quality, uptime, and
utilization.
About II-VI Incorporated
II-VI Incorporated, a global leader in engineered materials and
optoelectronic components, is a vertically integrated manufacturing
company that develops innovative products for diversified
applications in communications, industrial, aerospace &
defense, semiconductor capital equipment, life sciences, consumer
electronics, and automotive markets. Headquartered in Saxonburg,
Pennsylvania, the Company has research and development,
manufacturing, sales, service, and distribution facilities
worldwide. The Company produces a wide variety of
application-specific photonic and electronic materials and
components, and deploys them in various forms, including integrated
with advanced software to support our customers. For more
information, please visit us at www.ii-vi.com.
CONTACT: |
Mark
LourieVice President, Corporate
Communicationscorporate.communications@ii-vi.comwww.ii-vi.com/contact-us |
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