Cabot Microelectronics to Collaborate on Next-Generation CMP Technology with IBM
January 29 2008 - 6:45AM
Business Wire
Cabot Microelectronics Corporation (Nasdaq:CCMP) today announced it
has entered into an agreement with International Business Machines
Corp. (IBM) to jointly develop chemical mechanical planarization
(CMP) technology for next-generation integrated circuit (IC)
devices. Under the agreement, Cabot Microelectronics will utilize
its industry-leading CMP experience and resources to
collaboratively address IBM�s 32 and 22 nanometer technology
challenges and develop effective CMP solutions for a variety of
applications, including new materials. "For almost twenty years,
since the early days of CMP technology, we have had a productive
and collaborative relationship with IBM as an important customer,
and we believe that this joint development program reflects and
furthers this positive relationship and our ability to bring value
to IBM and its customers," stated William P. Noglows, Cabot
Microelectronics' Chairman and Chief Executive Officer. "IBM is
excited to be collaborating with Cabot Microelectronics in order to
deliver leading edge CMP solutions," said Paul Farrar, Vice
President SRDC Process Development for IBM. "The fast pace of
development makes it critical for materials suppliers and device
makers to work together closely early in the research and
development cycle in order to advance process technology." The
research for this joint development program will take place in
conjunction with IBM Research at Albany Nano-Tech, Albany NY, and
at Cabot Microelectronics� research and development center in
Aurora, IL. ABOUT CABOT MICROELECTRONICS CORPORATION Cabot
Microelectronics Corporation, headquartered in Aurora, Illinois, is
the world's leading supplier of CMP slurries used in semiconductor
and data storage manufacturing. The company's products play a
critical role in the production of the most advanced semiconductor
devices, enabling the manufacture of smaller, faster and more
complex devices by its customers. Since becoming an independent
public company in 2000, the company has grown to approximately 750
employees on a global basis. The company's vision is to become the
world leader in shaping, enabling and enhancing the performance of
surfaces, so the company is leveraging its expertise in CMP slurry
formulation, materials and polishing techniques developed for the
semiconductor industry and applying it to demanding surface
modification applications in other industries where shaping,
enabling and enhancing the performance of surfaces is critical to
success. For more information about Cabot Microelectronics
Corporation, visit www.cabotcmp.com or contact Amy Ford, Director
of Investor Relations at (630) 499-2600. SAFE HARBOR STATEMENT This
news release may include statements that constitute "forward
looking statements" within the meaning of federal securities
regulations. These forward-looking statements include statements
related to: future sales and operating results; company and
industry growth or trends; growth of the markets in which the
company participates; international events; product performance;
the generation, protection and acquisition of intellectual
property, and litigation related to such intellectual property; new
product introductions; development of new products, technologies
and markets; the acquisition of or investment in other entities;
uses of the company�s cash balance; and the construction facilities
by Cabot Microelectronics Corporation. These forward-looking
statements involve a number of risks, uncertainties, and other
factors, including those described from time to time in Cabot
Microelectronics' filings with the Securities and Exchange
Commission (SEC), that could cause actual results to differ
materially from those described by these forward-looking
statements. In particular, see "Risk Factors" in the company�s
annual report on Form 10-K for the fiscal year ended September 30,
2007, filed with the SEC. Cabot Microelectronics assumes no
obligation to update this forward-looking information.
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