Nova Introduces its Next Generation HVM Scatterometry-based Metrology Solution
July 10 2006 - 8:09AM
PR Newswire (US)
NovaScan(r) 3090Next-SA System Offers a Wide Range of 2D/3D and
In-Die Metrology Solutions for Dielectric and Copper CMP,
Photolithography, Etch and CVD REHOVOT, Israel, July 10
/PRNewswire-FirstCall/ -- Nova Measuring Instruments Ltd.
(NASDAQ:NVMI), the market leader in integrated measurement and
process control for the semiconductor industry, today launched the
next generation of its NovaScan metrology systems, the NovaScan(R)
3090Next series. The first system in the series is the NovaScan
3090Next-SA, a stand-alone, high-end metrology system, which
provides improved topography modeling, faster throughput and
excellent matching between tools and fabs. This is done through
implementation of polarized normal-incidence spectroscopic
scatterometry, with an extended ultraviolet and infrared spectral
range, for measuring the thickness and topography of thin films
widely used in semiconductor manufacturing. The NovaScan
3090Next-SA supports all industry requirements for high volume
manufacturing. A major highlight of the NovaScan 3090Next-SA is its
new 2D/3D modeling functions, which are based on the company's
unique NovaMARS(TM) modeling and application development software.
NovaMARS provides a solution for the latest industry requirements
for advanced structure modeling. This allows for enhanced solutions
that identically match what is really on the wafer, and is critical
for process control of advanced technologies at 45nm and beyond.
Another highlight of the NovaScan 3090Next-SA is its high
throughput. The NovaScan 3090Next-SA provides the extremely fast
throughput of 150 wafers per hour with a single metrology module.
With this high throughput rate, the NovaScan 3090Next-SA can
support higher sampling rates, while allowing it to keep up with
high throughput process tools such as photolithography tracks. This
ultimately leads to a very attractive cost of ownership (COO). The
system's main applications include full pattern profiling in 2D/3D
with multiple critical dimensions measurements, as well as
thickness measurement of Dielectric, Poly-silicon and very thin
conducting layers, on either multi-layer stacks, on silicon or
metal stacks. Nova's approach ensures the best solution for high
volume manufacturing (HVM) environments, where Stand Alone (SA) and
Integrated Metrology (IM) systems are working together. Nova's
solution is also ideal where tool-to-tool matching and recipe
transportability are essential. At the same time, the system also
provides for excellent matching performance between various areas
in the fab and between fab sites. Bents Kidron, Nova's Director of
Marketing, stated: "The NovaScan 3090Next-SA delivers the
measurement capabilities needed for control of high-end 65nm and
45nm CMP, Etch, Photolithography and CVD applications. The NovaScan
3090Next-SA metrology system is fully compatible with the NovaScan
3090 series that we successfully introduced to the market in 2005,
offering integrated metrology for CMP and Etch, and a Stand Alone
solution. We believe that this new platform offers our customers a
great solution for their High Volume Manufacturing metrology
needs." About Nova: Nova Measuring Instruments Ltd. develops,
designs and produces integrated process control systems in the
semiconductor manufacturing industry. Nova provides a broad range
of integrated process control solutions that link different
semiconductor processes and process equipment. The Company's
website is http://www.nova.co.il/ This press release may contain
forward-looking statements within the meaning of safe harbor
provisions of the Private Securities Litigation Reform Act of 1995
relating to future events or our future performance, such as
statements regarding, Forward-looking statements involve known and
unknown risks, uncertainties and other factors that may cause our
actual results, levels of activity, performance or achievements to
be materially different from any future results, levels of
activity, performance or achievements expressed or implied in those
forward-looking statements. These risks and other factors include
but are not limited to: changes in customer demands for our
products, new product offerings from our competitors, changes in or
an inability to execute our business strategy, unanticipated
manufacturing or supply problems, changes in tax requirements or
the applicability of those requirements to Nova and changes in
customer demand for our products. We cannot guarantee future
results, levels of activity, performance or achievements. The
matters discussed in this press release also involve risks and
uncertainties summarized under the heading "Risk Factors" in Nova's
Annual Report on Form 20-F for the year ended December 31, 2005
filed with the Securities and Exchange Commission on June 29, 2005.
These factors are updated from time to time through the filing of
reports and registration statements with the Securities and
Exchange Commission. Nova Measuring Instruments Ltd. does not
assume any obligation to update the forward-looking information
contained in this press release. DATASOURCE: Nova Measuring
Instruments Ltd CONTACT: Company Contact: Mr. Dror David, CFO, Nova
Measuring Instruments Ltd., Tel: +972-8-938-7505, E-mail: ,
http://www.nova.co.il/; Investor Relations Contacts: Ehud Helft /
Kenny Green, GK Investor Relations, Tel: +1-866-704-6710, E-mail :
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