NEW YORK, Nov. 28, 2018 /CNW/ - RYU Apparel Inc.
(TSX VENTURE: RYU.V, OTCQB: RYPPF), creators of
urban athletic apparel, celebrates its flagship opening in
Williamsburg with a capsule
collection highlighting four local New
York artists. Curated by NYC graffiti legend, Stash, the
collaboration includes four graphic tees and sweatshirts featuring
the word "Respect," designed by Futura, CES, WANE, and Stash in
each artist's signature aesthetic.
The project kicks off a larger series featuring local artists
and reinforces RYU's dedication to its local community and building
relationships with consumers.
Following the Williamsburg
launch, RYU will roll out additional artist series in other US
locations. The next iteration will drop exclusively at the RYU
Venice Beach location designed by LA based artists, Eklipse, Push,
Trav, and Rime.
"Each of these artists bring something different to their
community and we couldn't be happier to be partnering with them. We
are looking forward to continuing this project as we expand within
the US." says CEO, Marcello
Leone.
"Respect is a word that is very important to me. I'm thrilled to
be working with RYU on this project and am excited that they are
embracing local creatives as part of their community," says
Stash.
Hypebeast recently featured the collection in their "Best of art
drops" story.
Link:
https://hypebeast.com/2018/11/best-art-for-sale-online-november-2018-week-2-james-jean-joya-arsham-studio
Hypebeast is the leading online destination for men's
contemporary fashion and streetwear, with over 6 Million monthly
unique visitors.
About the Artists
FUTURA
Futura is a contemporary American graffiti
artist. Over the course of his career, he transitioned from making
New York-based subway graffiti in
the early 1970s, to exhibiting at Fun Gallery in the 1980s
alongside major artists such as Jean-Michel
Basquiat, Keith Haring, and
Kenny Scharf. Born Leonard McGurr on November 17, 1955 in New York, NY, he went on to collaborate with
the punk band The Clash, designing their album art and performing
live graffiti during their concerts. McGurr's major contribution to
graffiti art was his use of abstraction, adopting a style of
painting characterized by its blending of text and imagery. Today,
McGurr's work can be found in the collections of the Museo de Arte
Moderna di Bologna, the Musée de Vire in France, and the Museum of the City of New York. No longer working in
graffiti, McGurr lives and works as a graphic designer in
Brooklyn, NY.
CES
Born Robert Michael
Provenzano in 1970 in the Bronx
(NY) to a middle class family, Ces began writing graffiti in
the early 80s. He's part of the second wave of writers, those that
innovated in letters. Influenced by the dynamics of the pioneers:
large images on trains, subways and walls, Ces helped develop the
writing commonly known as wildstyle. The NY wildstyle that Ces was
instrumental in developing employed more jagged, aggressive, and
hard edge letters as opposed in the rounded script of classical
graffiti.
Ces, also known as Wish, has produced large aerosol murals in
various countries and continents. Ces's work is well documented in
many videos, like FX, a video about New
York-based graffiti writers.
WANE
In 1983, Wayne became 'Wane One' when he painted
his first train. This was the beginning of a lifelong love for
graffiti and the culture that surrounded it. Subway cars and train
walls were his favorite canvases. He had an unquenchable
thirst for painting his pieces onto these metal surfaces, thus
transforming them into mobile works of art. In 1988, Wane
started experimenting and exploring other medias, such as painting
with acrylic on canvas, denim jackets and jeans. He then began
airbrushing onto t-shirts, which became popular in his neighborhood
and gave Wane his first taste of being an entrepreneur. Wane
was also one of the first writers to make the transition into
Graphic Design and has designed logos for hip-hop groups like
Gangstarr, Jeru the Damager and Group Home. Presently, Wane
divides his time between painting, running his company Writers
Bench, designing for Sean John Menswear, Nike, and Reebok and
traveling around the world. Wane still resides in the Bronx.
STASH
Stash – real name Josh
Franklin, was born in Long
Island, New York in 1967.
He is considered one of New York's
graffiti legends, pivotal to the East Village scene of the early
1980's.
Stash exhibited his first canvases alongside pop art pioneers,
Keith Haring and Jean-Michael Basquiat when he was only 17. While
his contemporaries turned to Pop Art, Stash stayed true to the
subway, working on trains until 1987 when he created his last
underground piece alongside Zephyr.
Stash's early works on canvas demonstrate a loyalty to his early
career in the use of subway map-collages and signature bold
outlines and clean shapes. By the late 1990's, Stash had pioneered
the use of graphic elements of graffiti on streetwear through
high-profile collaborations with companies such as Nike and Bathing
Ape. The move ensured his work reached a much wider audience than
the gallery visitor and played a key role in the widespread
understanding of graffiti, which in turn led to its public
acceptance.
Stash is now firmly established as an innovator and influencer
in the world of urban design, and his fascination with the urban
environment is also evident in his perfectly executed photographic
work, which features a combination of city motifs alongside the
latest lighting and printing techniques.
About RYU
Respect Your Universe is an award-winning urban athletic apparel
and accessories brand engineered for the fitness, performance and
lifestyle of the athletic man and woman. Designed without
compromise for fit, comfort, and durability, RYU exists to
facilitate human performance. For more information, visit:
http://ryu.com
On Behalf of the Board
RYU APPAREL INC.
"Marcello Leone"
Marcello Leone, CEO,
President and Chairman of the Board
Tel: 604-235-2880
Neither the TSX Venture Exchange nor its Regulation Services
Provider (as that term is defined in policies of the TSX Venture
Exchange) accepts responsibility for the adequacy or
accuracy of this release.
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