MOUNTAIN VIEW, Calif. and
GLOUCESTER, Mass., Feb. 10, 2011 /PRNewswire/ -- Synopsys, Inc.
(Nasdaq: SNPS), a world leader in software and IP for semiconductor
design, verification and manufacturing, and Varian Semiconductor
Equipment Associates, Inc. (Nasdaq: VSEA), the leading producer of
ion implantation equipment used in the manufacture of
semiconductors, today announced a collaboration to develop
Technology CAD (TCAD) models for cryogenic ion implantation. By
enabling faster optimization of the cryogenic implant process
through simulation, the models derived from this collaboration will
speed up process development of advanced CMOS and memory
technologies and reduce process development cost and
time-to-market.
Ion implantation forms transistor structures in semiconductor
silicon through energetic ion beams. These ions disrupt the crystal
structure of the silicon, creating end-of-range damage that impacts
device performance as devices shrink. To neutralize the damage,
Varian's latest generation of high current implanters enables the
ion implantation process to occur at reduced wafer temperature
(cryogenic implant), resulting in significant reduction of
end-of-range damage, minimizing device leakage and widening process
margins.
"Today semiconductor manufacturers face tremendous challenges in
improving device performance, achieving high product yield,
reducing process R&D costs and meeting time-to-market targets.
Therefore, it is increasingly critical for simulation to support
novel process techniques to reduce technology development time and
cost," said Dr Yuri Erokhin, senior
director for strategic technologies at Varian. "Cryogenic ion
implant has been proven to significantly improve transistor
performance and is a key enabler in the manufacture of advanced
devices. This collaboration with Synopsys will enable our mutual
customers to explore and optimize the cryogenic implant process
with simulation, reducing time-to-market."
Through this collaboration, Synopsys will use experimental data
from Varian's cryogenic implant process to develop and calibrate
models for its TCAD Sentaurus tools, which are widely used by
semiconductor companies in the development and optimization of new
manufacturing technologies.
"To reduce development time and cost, our customers need TCAD
models that are calibrated to the actual equipment used to
fabricate the silicon," said Howard
Ko, senior vice president and general manager of the Silicon
Engineering Group at Synopsys. "Our joint work with Varian to
develop TCAD models for this new cryogenic implant process is an
example of our commitment to keep our TCAD Sentaurus tools at the
forefront of semiconductor process development."
About Synopsys
Synopsys, Inc. (Nasdaq:SNPS) is a world leader in electronic
design automation (EDA), supplying the global electronics market
with the software, intellectual property (IP) and services used in
semiconductor design, verification and manufacturing. Synopsys'
comprehensive, integrated portfolio of implementation,
verification, IP, manufacturing and field-programmable gate array
(FPGA) solutions helps address the key challenges designers and
manufacturers face today, such as power and yield management,
system-to-silicon verification and time-to-results. These
technology-leading solutions help give Synopsys customers a
competitive edge in bringing the best products to market quickly
while reducing costs and schedule risk. Synopsys is headquartered
in Mountain View, California, and
has approximately 70 offices located throughout North America, Europe, Japan, Asia
and India. Visit Synopsys online
at http://www.synopsys.com/.
About Varian Semiconductor
Varian Semiconductor Equipment Associates is the leading
supplier of ion implant equipment to semiconductor manufacturers,
enabling them to pack more, higher performing transistors into
computer chips that are revolutionizing the electronics industry.
Varian Semiconductor's products are used by chip manufacturers
worldwide to produce high-performance semiconductor devices.
Customers have made Varian Semiconductor the market leader in ion
implant because of its architecturally superior products that lower
their costs and improve their productivity. Varian Semiconductor
operates globally and is headquartered in Gloucester, Massachusetts. More information
can be found on Varian Semiconductor's web site at
www.vsea.com.
Forward Looking Statements
This press release contains forward-looking statements within
the meaning of Section 27A of the Securities Act of 1933 and
Section 21E of the Securities Exchange Act of 1934, including
statements regarding the expected benefits and results of the
collaboration to develop Technology CAD (TCAD) models for cryogenic
ion implantation, between Synopsys and Varian Semiconductor
Equipment Associates. These statements are based on Synopsys'
current expectations and beliefs. Actual results could differ
materially from these statements as a result of unforeseen
difficulties in completing the collaboration and the other factors
contained in the section of Synopsys' Annual Report on Form 10-K
for the fiscal year ended October 31,
2010 entitled "Risk Factors."
Synopsys is a registered trademark of Synopsys, Inc. Any other
trademarks or registered trademarks mentioned in this release are
the intellectual property of their respective owners.
Editorial
Contacts:
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Sheryl Gulizia
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Bob Halliday
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Synopsys, Inc.
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Executive Vice President and
CFO
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650-584-8635
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Varian Semiconductor Equipment
Associates
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sgulizia@synopsys.com
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978-282-7597
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Lisa Gillette-Martin
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Tom Baker
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MCA, Inc.
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Vice President,
Finance
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650-968-8900 x115
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Varian Semiconductor Equipment
Associates
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lgmartin@mcapr.com
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978-282-2301
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SOURCE Synopsys, Inc.