AIXTRON Enters Into an R&D Alliance With a Top Tier IC Manufacturer
March 15 2005 - 5:00AM
PR Newswire (US)
AIXTRON Enters Into an R&D Alliance With a Top Tier IC
Manufacturer AACHEN, Germany, March 15 /PRNewswire-FirstCall/ --
AIXTRON AG (FSE: AIX; ISIN DE0005066203), a leading provider of
deposition equipment to the semiconductor industry, and a major IC
manufacturer have entered into an R&D alliance to qualify novel
metals for the production of sub 45nm generation logic devices.
Sub-45 nm process technologies will require advanced materials and
innovative deposition solutions in order to stay at the forefront
of the semiconductor technology roadmap. This is particularly true
for the transistor gate stack in logic devices where many top IC
manufactures are putting in substantial efforts to overcome the
hurdles limiting the realization of future device scaling. This
joint program will focus on metal gate electrode development for
sub 45nm CMOS generations. The initial work will focus on: --
Evaluation of various metal gate materials for large-scale
production purposes -- Integration of those materials into high-k
gate stacks -- Optimization of PMOS as well as NMOS device
structures for Sub-45nm logic The process and material development
work will be conducted on an AIXTRON Tricent(R) AVD(R) (Atomic
Vapor Deposition) system offering 200 and 300 mm wafer processing
capabilities. AIXTRON's patented proprietary AVD(R) technology
enables atomic scale thickness control, while achieving high
deposition rates, by utilizing the unique TRIJET(R) pulsed
precursor injection source. This proprietary technology allows the
simultaneous injection of precursor chemistries, providing
outstanding control of the deposition of multi-component materials.
Tim McEntee, Executive Vice President and COO Semiconductor
Equipment of AIXTRON AG, commented: "This agreement represents an
important step forward in further strengthening AIXTRON's position
for providing enabling deposition solutions for these emerging
semiconductor applications. By forging this partnership with one of
the top IC manufacturers in the industry, AIXTRON will remain at
the forefront of cutting edge enabling MOCVD process technology
development, building on its 20-year history of delivering complex
material solutions to the high-tech industry." McEntee continued:
"We look forward to combining our knowledge and experience to
develop solutions to address these new material challenges.
Equally, this program represents an important complementary effort
to AIXTRON's on-going high-k development activities within the
MEDEA T207 program at ST Microelectronics in Crolles (F) as well as
AIXTRON's ongoing JDP program in partnership with IMEC." About
AIXTRON AIXTRON AG is a leading provider of equipment for compound
semiconductor epitaxy. The Company's products are used by a diverse
range of customers worldwide to manufacture advanced semiconductor
components such as HBTs, PHEMTs, MESFETs, Lasers, LEDs, Detectors,
and VCSELs used in fiber optic communication systems, wireless and
mobile telephony applications, optical storage devices,
illumination, signaling and lighting, as well as a range of other
leading-edge technologies. AIXTRON AG's securities are listed in
the Prime Standard market segment of the Frankfurt Stock Exchange
and are included both in the TecDAX index and the MSCI World Index.
More information about AIXTRON can be found on the Web at
http://www.aixtron.com/. Forward-Looking Statements This news
release may contain forward-looking statements about the business,
financial condition, results of operations and earnings outlook of
AIXTRON within the meaning of the "safe harbor" provisions of the
United States Private Securities Litigation Reform Act of 1995.
Words such as "may," "will," "expect," "anticipate," "contemplate,"
"intend," "plans," "believe," "continue" and "estimate," and
variations of these words and similar expressions, identify these
forward-looking statements. These statements are not guarantees of
future performance, involve certain risks, uncertainties and
assumptions that are difficult to predict, and are based upon
assumptions as to future events that may not prove accurate.
Therefore, actual outcomes and results may differ materially from
what is expressed herein. In any forward- looking statement in
which AIXTRON expresses an expectation or belief as to future
results, such expectation or belief is expressed in good faith and
believed to have a reasonable basis, but there can be no assurance
that the statement or expectation or belief will result or be
achieved or accomplished. Actual operating results may differ
materially from such forward-looking statements and are subject to
certain risks, including risks arising from: actual customer orders
received by AIXTRON; the extent to which metal-organic chemical
vapor deposition, or MOCVD, technology is demanded by the market
place; the timing of final acceptance of products by customers; the
financial climate and accessibility of financing; general
conditions in the thin film equipment market and in the
macro-economy; cancellations, rescheduling or delays in product
shipments; manufacturing capacity constraints; lengthy sales and
qualification cycles; difficulties in the production process;
changes in semiconductor industry growth; increased competition;
exchange rate fluctuations; availability of government funding;
variability and availability of interest rates; delays in
developing and commercializing new products; general economic
conditions being less favorable than expected; and other factors.
The forward-looking statements contained in this news release are
made as of the date hereof and AIXTRON does not assume any
obligation to (and expressly disclaims any such obligation to)
update the reasons why actual results could differ materially from
those projected in the forward-looking statements. Any reference to
the Internet website of AIXTRON is not an incorporation by
reference of such information in this news release, and you should
not interpret such a reference as an incorporation by reference of
such information. DATASOURCE: AIXTRON AG CONTACT: Investor
Relations and Corporate Communications of AIXTRON AG,
+49-241-8909-444, or fax, +49-241-8909-445, or Web site:
http://www.aixtron.com/
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