Cabot Microelectronics Corporation Receives Supplier Award from Semiconductor Manufacturing International Corporation (SMIC)
July 23 2007 - 7:30AM
Business Wire
Cabot Microelectronics Corporation (NASDAQ:CCMP), the world�s
leading supplier of chemical mechanical planarization (CMP)
polishing slurries to the semiconductor industry, announced today
that it has been awarded SMIC�s Excellent Supplier Award. SMIC
selected Cabot Microelectronics in recognition and appreciation of
its long-term partnership and support of SMIC in the areas of
quality, supply assurance, performance and cost. The ability to
expand with SMIC�s growing business in China was also crucial to
the supplier award. The company supplies SMIC with CMP polishing
slurries for Copper, Tungsten, and Dielectrics applications. Cabot
Microelectronics and 14 other material supplier award winners were
presented the award in Shanghai on July 9 during SMIC�s key
supplier week. �We are honored to have earned this award from such
an important customer,� stated William Noglows, Chairman and CEO of
Cabot Microelectronics Corporation. �Our commitment to technology
leadership, operations excellence and connecting with our customers
is steadfast, and with continued success in these areas we will be
well positioned to continue to build on our strong relationship
with SMIC.� ABOUT CABOT MICROELECTRONICS CORPORATION Cabot
Microelectronics Corporation, headquartered in Aurora, Illinois, is
the world's leading supplier of CMP slurries used in semiconductor
and data storage manufacturing. The company's products play a
critical role in the production of the most advanced semiconductor
devices, enabling the manufacture of smaller, faster and more
complex devices by its customers. Since becoming an independent
public company in 2000, the company has grown to approximately 750
employees who work at research and development labs, sales and
business offices, manufacturing facilities and customer service
centers in China, France, Germany, Japan, Singapore, South Korea,
Taiwan, the United Kingdom, and the United States. The company's
vision is to become the world leader in shaping, enabling and
enhancing the performance of surfaces. The company is leveraging
its expertise in CMP slurry formulation, materials and polishing
techniques developed for the semiconductor industry and applying it
to demanding surface modification applications in other industries
where shaping, enabling and enhancing the performance of surfaces
is critical to success. For more information about Cabot
Microelectronics Corporation, visit www.cabotcmp.com or contact Amy
Ford, Director of Investor Relations, at 630-499-2600. SAFE HARBOR
STATEMENT This news release may include statements that constitute
�forward looking statements� within the meaning of federal
securities regulations. These forward-looking statements include
statements related to: future sales and operating results; company
and industry growth or trends; growth of the markets in which the
company participates; international events; product performance;
the generation, protection and acquisition of intellectual
property, and litigation related to such intellectual property; new
product introductions; development of new products, technologies
and markets; the acquisition of or investment in other entities;
and the construction of new or refurbishment of existing facilities
by Cabot Microelectronics Corporation. These forward-looking
statements involve a number of risks, uncertainties, and other
factors, including those described from time to time in Cabot
Microelectronics� filings with the Securities and Exchange
Commission (SEC), that could cause actual results to differ
materially from those described by these forward-looking
statements. In particular, see �Risk Factors" in the company�s
quarterly report on Form 10-Q for the quarter ended March 31, 2007
and in the company�s annual report on Form 10-K for the fiscal year
ended September 30, 2006, both filed with the SEC. Cabot
Microelectronics assumes no obligation to update this
forward-looking information.
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