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Period:
Draw Mode:
| Volume | 3,493 |
|
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| News | - | ||||||
| Day High | 40.75 | Low High |
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| Day Low | 39.44 | ||||||
| Company Name | Stock Ticker Symbol | Market | Type |
|---|---|---|---|
| Ferrovial SE | FER | NASDAQ | Common Stock |
| Price Change | Change Percent | Stock Price | Last Traded
|
|
|---|---|---|---|---|
| 0.245 | 0.61% | 40.495 | 16:05:59 |
| Open Price | Low Price | High Price | Close Price | Prev Close |
|---|---|---|---|---|
| 40.75 | 39.44 | 40.75 | 40.495 | 40.25 |
| Trades | Volume | VWAP | Dollar Volume | Avg Volume | 52 Week Range |
|---|---|---|---|---|---|
| 81 | 3,493 | $ 40.10 | $ 140,077 | - | 37.00 - 48.29 |
| Last Trade Time | Type | Quantity | Stock Price | Currency |
|---|---|---|---|---|
| 16:00:00 | 100 | $ 40.495 | USD |
Ferrovial SE Financials
| Market Cap | Shares in Issue | Float | Revenue | Profit/Loss | EPS | PE Ratio |
|---|---|---|---|---|---|---|
| 26.96B | 740.69M | - | 8.54B | 460M | 0.62 | 58.62 |
| Short Interest | Dividends Per Share | Dividend Yield | Ex-Div Date | Insider B/S | Insider % Owned |
|---|---|---|---|---|---|
| - | - | - | - |
Ferrovial News
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Historical FER Price Data
| Period | Open | High | Low | VWAP | Avg. Daily Vol | Change | % |
|---|---|---|---|---|---|---|---|
| 1 Week | 40.00 | 41.70 | 39.205 | 40.14 | 19,117 | 0.495 | 1.24% |
| 1 Month | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
| 3 Months | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
| 6 Months | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
| 1 Year | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
| 3 Years | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
| 5 Years | 47.22 | 48.29 | 37.00 | 40.37 | 38,469 | -6.73 | -14.24% |
Ferrovial Description
| ASML Holding NV is founded in 1984 and based in the Netherlands, ASML is the leader in photolithography systems used in the manufacturing of semiconductors. Photolithography is the process in which a light source is used to expose circuit patterns from a photomask onto a semiconductor wafer. The latest technological advances in this segment allow chipmakers to continually increase the number of transistors on the same area of silicon, with lithography historically representing a meaningful portion of the cost of making cutting-edge chips. Chipmakers require next-generation EUV lithography tools from ASML to continue past the 5-nanometer process node. |
