Nanometrics Announces the Atlas III+ for Advanced Process Control Metrology
April 30 2019 - 04:10PM
Nanometrics Incorporated (NASDAQ: NANO), a leading provider of
advanced process control solutions, today announces the Atlas® III+
platform for advanced process control metrology. The Atlas
III+ has been qualified at multiple memory and foundry/logic device
manufacturers, each utilizing Nanometrics’ proprietary analysis
software including NanoDiffract® and SpectraProbe™. With its unique
combination of spectroscopic ellipsometry (SE) with full Mueller
Matrix capability and broadband reflectometry (SR), the Atlas III+
provides industry-leading metrology performance while also
providing increased productivity on the most demanding devices,
both in development and high-volume production.
“The Atlas III+ extends Nanometrics’ platform technology with
simultaneously increased productivity, better sensitivity and
improved accuracy, continuing our position as the leaders in the
industry for Optical Critical Dimension (OCD) metrology,” stated
Sudhakar Raman, vice president and general manager of the automated
metrology business unit at Nanometrics. “The Atlas III+ has
been qualified on the industry’s most advanced devices for leading
memory and foundry/logic customers. With significant
enhancements to key subsystems including our proprietary
ellipsometry and reflectometry technologies, the Atlas III+ is
driving OCD productivity and applications adoption to the next
level. Our customers are measuring more critical features per
wafer, across more wafers per lot, and in more steps in the
process, as they drive for better manufacturing yield and device
performance. The Atlas III+ is enabling a new metrology
paradigm with significantly higher sampling to satisfy our
customers’ increasing demand for data.”
The Atlas III+ is the latest in the family of combination SE/SR
systems for advanced fab metrology and process control, and is our
flagship automated system supporting advanced OCD and thin-film
metrology with our proprietary ellipsometry and reflectometry
technologies. The Atlas III+ delivers best-in-class precision
and repeatability at a faster overall system throughput, supporting
a broad variety of process control applications. When
combined with NanoDiffract, the Atlas III+ enables high-fidelity
metrology on the most complex three-dimensional structures.
When utilizing SpectraProbe, the Atlas III+ provides unique insight
into on-device and in-die control for advanced yield learning and
process optimization.
Nanometrics has shipped multiple systems that are currently in
volume production at both foundry/logic and memory customers.
About NanometricsNanometrics is a leading
provider of advanced, high-performance process control metrology
and inspection solutions used primarily in the semiconductor
manufacturing industry, as well as in the fabrication of other
solid-state devices and components in the optoelectronic, LED and
storage industries, and more recently in the industrial, aerospace
and scientific research markets. Nanometrics’ process control
solutions include automated and integrated metrology systems as
well as software and analytics that measure and monitor key
elements of device performance and yield, such as critical
dimensions, device structures, surface shape and profile, overall
topography and various thin film properties, including
three-dimensional features and film thickness, as well as the
optical, electrical and material properties of various substrates,
devices and components. Nanometrics’ solutions enable
advanced process control for device manufacturers, providing
improved device yield at reduced manufacturing cycle time,
supporting the accelerated product life cycles in the semiconductor
and other advanced markets. The company maintains its headquarters
in Milpitas, California, with sales and service offices worldwide.
Nanometrics is traded on Nasdaq Global Select Market under the
symbol NANO. Nanometrics’ website is
http://www.nanometrics.com.
Forward Looking
StatementsCertain statements in this press release are
forward-looking statements that involve a number of risks and
uncertainties that could cause actual results to differ materially
from those described in this release. Although Nanometrics
believes that the expectations reflected in the forward-looking
statements are reasonable, actual results could differ materially
from these expectations due to a variety of factors, including, but
not limited to: Nanometrics’ inability to ship products as
scheduled or achieve customer acceptance of new products; shifts in
the timing of customer orders and product shipments; and general
economic conditions. For additional information and considerations
regarding the risks faced by Nanometrics that could cause actual
results to differ materially, see its annual report on Form 10-K
for the year ended December 29, 2018, as filed with the Securities
and Exchange Commission on February 25, 2019 including under the
caption “Risk Factors,” as well as other periodic reports filed
with the SEC from time to time. Nanometrics disclaims any
obligation to update information contained in any forward-looking
statement, except as required by law.
Investor Relations Contact:
Claire McAdams
Headgate Partners LLC
530.265.9899
claire@headgatepartners.com
Company Contact:
Kevin Heidrich
SVP Corporate Development
503.207.4611
kheidrich@nanometrics.com
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