Applied Materials Introduces High-Performance ALD Technology for the 3D Era
July 13 2015 - 7:31AM
- Innovative Olympia(TM) system
positions Applied at the forefront of ALD* technology
- Unique architecture expands
portfolio of high-quality ALD films, enables critical
low-temperature processes without compromising
productivity
- Systems installed at leading
chipmakers for multiple logic and memory device
applications
SANTA CLARA, Calif., July 13, 2015 - Applied
Materials, Inc. today unveiled the Applied Olympia(TM) ALD system
featuring a unique, modular architecture that delivers
high-performance ALD technology to manufacturers of leading-edge 3D
memory and logic chips. The 3D device inflection is driving growth
in ALD with demand for new patterning films, new conformal
materials and lower thermal budgets. The Olympia system is well
positioned to fulfill these requirements with uncompromising ALD
performance, addressing industry needs with the process flexibility
to precisely engineer and efficiently deposit a variety of
low-temperature, high-quality films for multiple applications.
"Our Olympia system is a major technology
innovation for the 3D device inflection," said Dr. Mukund
Srinivasan, vice president and general manager of Applied's
Dielectric Systems and Modules group. "The Olympia system overcomes
fundamental limitations chipmakers are experiencing with
conventional ALD technologies, such as reduced chemistry control of
single-wafer solutions and long cycle times of furnaces. Because of
this, we're seeing strong market response with Olympia systems
installed at multiple customers to support their move to 10nm and
beyond."
The Olympia system's adaptable modular
architecture enables a uniquely flexible and rapid process sequence
vital for controlling the more complex chemistries needed to
develop the next generation of ALD films. Further, the modular
design creates complete separation of chemistries, eliminating the
pump/purge steps of conventional ALD technologies for improved
productivity. The combined advantages of the Olympia system offer a
superior solution to conventional ALD systems and position the tool
for widespread adoption.
Applied Materials, Inc. (Nasdaq:AMAT) is the
global leader in materials engineering solutions for the
semiconductor, flat panel display and solar photovoltaic
industries. Our technologies help make innovations like
smartphones, flat screen TVs and solar panels more affordable and
accessible to consumers and businesses around the world. Learn more
at www.appliedmaterials.com.
*ALD=atomic layer deposition
# # #
Contact:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
Applied Olympia™ ALD
System
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The issuer of this announcement warrants that they are solely
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Source: Applied Materials via Globenewswire
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