Applied Materials' New Etch System Provides Atomic-Level Precision
July 13 2015 - 7:30AM
SANTA CLARA, Calif., July 13, 2015 - Applied
Materials, Inc. today announced a next-generation etch tool,
the Applied Centris(TM) Sym3(TM) Etch system, featuring
an entirely new chamber for atomic-level precision manufacturing.
To overcome within-chip feature variations, the Centris Sym3 system
leapfrogs current tools to provide chipmakers with the control and
precision needed to pattern and create densely packed 3D structures
in advanced memory and logic chips.
"Drawing on over 20 years of etch learning and our
expertise in precision materials removal, the Sym3 system
represents a brand new design, built from the ground up, that
solves persistent and impending industry challenges," said Dr.
Raman Achutharaman, vice president and general manager of Applied's
Etch business unit. "Customer traction has been remarkable,
resulting in the fastest adoption rate we've seen for an etch tool
in the company's history, with record ramp to production at
leading-edge fabs."
The Centris Sym3 etch chamber employs Applied's
unique True Symmetry(TM) technology with multiple tuning controls
for optimizing global process uniformity to the atomic level. Key
to the design is a focus on controlling and removing etch
byproducts, which are increasingly hampering within-chip patterning
uniformity. The system mitigates byproduct re-deposition to
overcome the challenges of line edge roughness, pattern loading
and defects - issues that are becoming more limiting for
each successive technology node. Combined with an advanced RF
technology that controls ion energy and angular distributions, the
Sym3 system delivers unsurpassed vertical profiles for high aspect
ratio 3D structures.
The Centris Sym3 platform's six etch and two
plasma clean process chambers feature system intelligence software
to ensure that every process in every chamber matches precisely,
enabling repeatability and high productivity for high-volume
manufacturing.
Applied Materials, Inc. (Nasdaq:AMAT) is the
global leader in materials engineering solutions for the
semiconductor, flat panel display and solar photovoltaic
industries. Our technologies help make innovations like
smartphones, flat screen TVs and solar panels more affordable and
accessible to consumers and businesses around the world. Learn more
at www.appliedmaterials.com.
###
Contacts:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
PHOTO: Applied Centris™ Sym3™ Etch
System
This
announcement is distributed by NASDAQ OMX Corporate Solutions on
behalf of NASDAQ OMX Corporate Solutions clients.
The issuer of this announcement warrants that they are solely
responsible for the content, accuracy and originality of the
information contained therein.
Source: Applied Materials via Globenewswire
HUG#1937581
Applied Materials (NASDAQ:AMAT)
Historical Stock Chart
From Mar 2024 to Apr 2024
Applied Materials (NASDAQ:AMAT)
Historical Stock Chart
From Apr 2023 to Apr 2024