MKS Introduces Dynamic Frequency Tuning Patented DFT Technology Offered in RF Plasma Generators
April 17 2014 - 9:00AM
MKS Instruments, Inc. (Nasdaq:MKSI), a global provider of
technologies that enable advanced processes and improve
productivity, has introduced Dynamic Frequency Tuning (DFT)
technology in RF plasma generators. DFT is a patented new
capability which provides significant enhancement over conventional
frequency tuning schemes which require more than 500µsec of course
and fine steps to search for the minima in reflected power. With
DFT, measurement of power distortion is used to quickly and
accurately achieve matched power in less than 50µsec. DFT assures
more power is delivered to the process and not mismatched or
wasted. This is important because the plasma is stabilized faster
making the process more controlled, consistent and repeatable.
DFT technology eliminates redundant sensing and control between
the RF power supply and the impedance matching network, enabling
the use of traditional control theory. This results in near
instantaneous and more accurate power tuning, especially important
during pulsed operation. DFT provides optimal tuning without the
need to constantly adjust configuration parameters when a process
change is made.
Used in semiconductor applications such as PECVD, PE-ALD and
oxide and poly etch, DFT technology has proven invaluable for
reduced plasma stabilization time resulting in more controlled,
consistent and repeatable etch and deposition steps. DFT, in
combination with MKS, ENI® Advanced RF pulsing, constitutes a key
technology in the fabrication of 3D NAND, FinFET, DRAM and TSV
devices. DFT and high frequency pulsing can prevent channel hole
bowing and twisting during 3D NAND Flash fabrication. DFT and
advanced pulsing are offered in RF plasma generator frequencies
from 2MHz to 100MHz.
Note to editors: For more information on Dynamic Frequency
Tuning, please go to the MKS web site: http://www.mksinst.com
About MKS:
MKS Instruments, Inc. is a global provider of instruments,
subsystems and process control solutions that measure, control,
power, monitor and analyze critical parameters of advanced
manufacturing processes to improve process performance and
productivity. Our products are derived from our core competencies
in pressure measurement and control, materials delivery, gas
composition analysis, control and information technology, power and
reactive gas generation, and vacuum technology. Our primary served
markets are manufacturers of capital equipment for semiconductor
devices, and for other thin film applications including flat panel
displays, solar cells, light emitting diodes, data storage media,
and other advanced coatings. We also leverage our technology in
other markets with advanced manufacturing applications including
medical equipment, pharmaceutical manufacturing, energy generation,
and environmental monitoring.
CONTACT: Corporate contact:
MaryAnn Naddy
Phone: 978-645-5538
Fax: 978-557-5100
MaryAnn_Naddy@mksinst.com
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