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| Company Name | Stock Ticker Symbol | Market | Type |
|---|---|---|---|
| CVD Equipment Corp | CVV | NASDAQ | Common Stock |
| Price Change | Change Percent | Stock Price | Last Traded
|
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|---|---|---|---|---|
| 0.00 | 0.00% | 4.37 | 20:00:00 |
| Open Price | Low Price | High Price | Close Price | Prev Close |
|---|---|---|---|---|
| 4.37 |
| Trades | Volume | Avg Volume | 52 Week Range |
|---|---|---|---|
| 0 | 0 | - | 3.93 - 11.70 |
| Last Trade Time | Type | Quantity | Stock Price | Currency |
|---|---|---|---|---|
| - | 0 | $ 4.37 | USD |
CVD Equipment Corp Financials
| Market Cap | Shares in Issue | Float | Revenue | Profit/Loss | EPS | PE Ratio |
|---|---|---|---|---|---|---|
| 29.55M | 6.82M | - | 24.11M | -4.18M | -0.61 | - |
| Short Interest | Dividends Per Share | Dividend Yield | Ex-Div Date | Insider B/S | Insider % Owned |
|---|---|---|---|---|---|
| - | - | - | - |
CVD Equipment News
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Historical CVV Price Data
| Period | Open | High | Low | VWAP | Avg. Daily Vol | Change | % |
|---|---|---|---|---|---|---|---|
| 1 Week | 4.88 | 5.06 | 4.26 | 4.46 | 25,210 | -0.51 | -10.45% |
| 1 Month | 4.95 | 6.35 | 4.26 | 5.14 | 40,874 | -0.58 | -11.72% |
| 3 Months | 5.16 | 6.35 | 4.26 | 5.03 | 19,189 | -0.79 | -15.31% |
| 6 Months | 6.84 | 6.88 | 3.93 | 5.01 | 21,000 | -2.47 | -36.11% |
| 1 Year | 10.74 | 11.70 | 3.93 | 6.19 | 18,901 | -6.37 | -59.31% |
| 3 Years | 4.05 | 15.82 | 3.68 | 6.40 | 42,730 | 0.32 | 7.90% |
| 5 Years | 3.62 | 15.82 | 1.95 | 5.67 | 75,775 | 0.75 | 20.72% |
CVD Equipment Description
| CVD Equipment Corp is engaged in the manufacturing of chemical vapor deposition equipment, customized gas control systems, the manufacturing of process equipment suitable for the synthesis of a variety of one-dimensional nanostructures and nanomaterials and a line of furnaces, all of which are used to produce semiconductors and other electronic components. The company operates through the segments of CVD, CVD materials and Stainless Design Concepts (SDC). Its CVD division, which generates maximum revenue, is utilized for silicon, silicon germanium, silicon carbide, and gallium arsenide processes. |
